論文

【論文掲載】超短時間で作製可能なウェットプロセスによるウルトラ・ハイバリアに関する論文が、WielyのAdvanced Science (IF=14.3)に掲載されました。

孫鶴(プロジェクト助教)、宋侣洋(プロジェクト研究員)、硯里(教授)のウェットプロセスによるウルトラ・ハイバリアに関する論文が、WielyのAdvanced Science (IF=14.3)に掲載されました。

ハイパワーランプを用いる事でわずか10秒のVUV光照射時間で光緻密化が起こり、高い水蒸気バリア性能を発揮することを明らかとしました。またVUV光によるポリシラザンの光反応過程も調査しています。

Luyang Song, He Sun*, Yoshiyuki Suzuri*
” Polysilazane-Coated Films Achieving Record-High Moisture Barrier Performance with Sub-10 Seconds Densification Using High-Power VUV Irradiation “
Adv. Sci. 2025, 2415721
https://advanced.onlinelibrary.wiley.com/doi/10.1002/advs.202415721

Abstract
An ultra-high moisture barrier compact SiNX film can be achieved from solution-processed perhydropolysilazane (PHPS) through vacuum ultraviolet (VUV) light exposure. This study investigates the photochemical reactions and photo-densification of PHPS-based barrier films under varying VUV light intensities, focusing on their effects on barrier performance. Photo-dehydrogenation of PHPS, involving N─H and Si─H bond cleavage, is efficient and unaffected by light intensity. However, photo-densification shows a strong dependence on light intensity, particularly above 290 mW cm−2. Higher intensities enhance Si─N bond cleavage, alter film dynamics, and reduce free volume through bond rearrangement, facilitating rapid network reconstruction essential for ultra-high barrier properties. High-power VUV light at 309 mW cm−2 establishes a new benchmark for ultra-high barrier films via solution processing, achieving a record-low average water vapor transmission rate (WVTR) of 1.6 × 10−5 g m−2 day−1. Films are produced in under 10 s per layer, maintaining a barrier property of 3.8 × 10−5 g m−2 day−1. The optimal refractive index for the top 30 nm layer is 1.74–1.77, controlling WVTR within 10−5 g m−2 day−1, ensuring superior barrier performance for flexible electronic devices, such as perovskite solar cells and organic photovoltaics.

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