【論文掲載】光緻密化PHPS膜の膜質に関する論文がJapanese Journal of Applied Physicsに掲載されました。
宋侣洋（プロジェクト研究員）、孫鶴（プロジェクト助教）、硯里（教授）の光緻密化PHPS膜の膜質に関する論文がJapanese Journal of Applied Physics（IF=1.8）に掲載されました。
光緻密化PHPS膜の表面を詳細に観察し、水蒸気バリア性能との関連性を議論しています。
Luyang Song*, He Sun and Yoshiyuki Suzuri*, “Morphological observation of photo-densified PHPS under 172 nm VUV irradiation at varying light intensities for moisture barrier applications” Jpn. J. Appl. Phys. 64, 08SP15 (2025) https://iopscience.iop.org/article/10.35848/1347-4065/adf6c3 DOI 10.35848/1347-4065/adf6c3 (OPEN ACCESS)
Abstract An ultra-high moisture barrier silicon nitride (SiNX) film was fabricated via solution-processed perhydropolysilazane (PHPS) under vacuum ultraviolet (172 nm) irradiation, achieving outstanding barrier performance in 10−5 g m−2 d−1 range. However, increasing the dose to 12 J cm−2 resulted in degraded barrier performance, which is considered to be caused by defects induced during densification process. In this study, surface analyses via coherence scanning interferometry (CSI) were discussed for revealing the structural changes. At 6 J cm−2 under high-intensity irradiation, a higher number of larger and deeper pores (up to ∼19 μm in diameter) were observed compared to lower-intensity conditions (∼13 μm). However, at 12 J cm−2, pore size and count remained stable despite deteriorated barrier performance, indicating that micron-sized pores are not the primary cause. These results highlight the critical role of combining surface-sensitive techniques to resolve the origins of degradation and demonstrate the value of CSI in evaluating nanometer-scale morphology across millimeter-scale areas for solution-processed barrier films.
